Sinomer® NNDMA is a kind of amide monomer with excellent performance, which is suitable for free radical photocuring reaction, and is widely used in unsaturated systems such as UV coatings, UV inks, and UV adhesives.
Good adhesion: good adhesion to most substrate materials
Active chemical properties: NNDMA monomer has double bonds and amide groups, so it is easy to carry out a variety of polymerization reactions with various monomers.
Good hydrophilicity: miscible with water, strong hygroscopicity, suitable for anti-fog coating
Others: ultra-low viscosity, good compatibility with resins, low curing shrinkage, good adhesion, etc.
